14 DAY TRIAL // NanoInk, Inc. and SII NanoTechnology Inc. (SIINT), a subsidiary of Seiko Instruments Inc., today announced that they have signed a licensing agreement to provide nanoscale repair solutions to the photomask industry.
The agreement requires that the two companies will collaborate on projects that will feature the modification of NanoInk's proprietary Dip Pen Nanolithography technology in order to be integrated with SIINT's photomask repair instruments and nanomachining platforms.
"This agreement offers SIINT the opportunity to work closely with a cutting edge US-based nanotechnology company that has a solid global intellectual property portfolio," said Dr. Hiroyuki Funamoto, President and Chief Executive Officer of SIINT. "With this co-development partnership, SIINT will bring innovative nanoscale repair solutions to the marketplace in the near future."
Both companies' representatives stated they anticipate that with computer chip nodes going down in size to 65nm and 45nm, the photomask repair industry will require capabilities that are available only with new technology provided by NanoInk's DPN.
NanoInk officials stated that they estimate an average of 65% of photomask customers based in Asia, and that, also because of this assessment, the company believes that SIINT is the best partner to offer an excellent sales and marketing infrastructure to service this challenging market.
"I am thrilled that SIINT has decided to partner with NanoInk to design and manufacture a platform that can integrate repair capabilities," said Dr. Cedric Loiret-Bernal, Chief Executive Officer and President, NanoInk, Inc. "We believe that this agreement will allow the introduction of our unique DPN technology to global customers while raising standards for repair within the photomask industry."
It was said in a statement that the production will be performed both in the U.S. and Japan. Unfortunately, up until now, financial terms of the agreement were not disclosed.