
Toshiba Corporation and Toshiba Semiconductor (Thailand) Co., Ltd. (TST) yesterday announced that they will build a new semiconductor production facility at TST in the Bangkadi Industrial Park, approximately 35 kilometers north of Bangkok. The project was initiated in order to boost Toshiba's production capacity of small-signal devices shipped on the Asian markets.
The manufacturer announced that it intends to invest no less than 2 billion yen in the construction of its new facility which will start in July. The representatives added that the building will feature a production area of over 8,000m2, and undertake production on high efficiency production lines that boost cost competitiveness.
Because the demand for the small-signal devices for consumer electronics equipment and mobile phones, is growing constantly, especially on the Asian Market, Toshiba seems determined to expand overseas production in the discrete business, and also to enhance production capacity at TST, a key Toshiba Group manufacturing facility for separate devices. The company announced that it will invest also in the production of its semiconductor businesses, especially in NAND flash memories at Yokkaichi Operations and advanced system LSI at Oita Operations.
"The Company is also assuring its continuing leadership in the global discrete devices market with investment like that in new production capacity for power devices at Kaga Toshiba Electronics Corporation, announced last May. The investment in TST takes proactive investment in discrete capacity to the international level," it is said in a press release issued by Toshiba.
Overview of new production facility -Structure of Building: Ferroconcrete
-Total Floor Area: approx. 12,000m2
-Total Production Area: approx. 8,000m2
-Start Construction: July, 2006
-Completion: March, 2007 (plan)