IBM and its partners present their own High-k + metal transistors

Jan 29, 2007 15:03 GMT  ·  By

As you might already know, thanks to the latest high-k + metal transistor developments, Intel is now able to ramp up the 45nm CPU production. The new technology is expected to be integrated in mobile, desktop and server solutions, later this year.

Moor's law is still holding true, but not much has changed over the years when it comes to transistors. All this is changed now that high-k + metal gate transistors have been shown to work in real life. Intel claims that it has had working high-k + metal gate transistors since 2003, but just recently has been able to implement the technology with the 45nm manufacturing process. The 'new' parts of this transistor are the gate dielectric, which now consists of a 'high-k' material and the gate electrode itself, which is now made of metal. By converting SiO2 gate dielectric to high-k, it allows thickening the dielectric layer while also increasing the gate field effect resulting in increased ?on? current, decreased ?off? current and significantly decreased gate leakage.

However, Intel is not the only company to achieve such breakthroughs. IBM also announced its own 45nm technological advancements that will apply to products manufactured in its East Fishkill, NY plant starting in 2008. IBM teamed up with AMD and other development partners, including Sony and Toshiba, and found a way to construct a critical part of the transistor with high-k metal gates, substituting a new material into a critical portion of the transistor that controls its primary on/off switching function. The improved material provides superior electrical properties compared to its silicon dioxide predecessor, enhancing the transistor's function while also reducing energy leakage.

IBM did not forget about the methods, which allow the introduction of the new technology into current manufacturing techniques. Thus, the creation of the improved transistor component was accomplished by IBM's team without requiring major tooling or process changes in manufacturing. This is an essential achievement in order for the technology to be economically viable.

?Until now, the chip industry was facing a major roadblock in terms of how far we could push current technology,? said Dr. T.C. Chen, vice president of Science and Technology, IBM Research. ?After more than ten years of effort, we now have a way forward. With chip technology so pervasive in our everyday lives, this work will benefit people in many ways.?